PATTERN SHAPE INSPECTION METHOD AND APPARATUS THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a pattern shape inspection method capable of inspecting fine pattern shape formed in an object to be inspected such as a discrete track medium and having nearly several ten nm or finer at high speed and with high sensitivity including a pattern edge state and to provide a device thereof. SOLUTION: The pattern shape inspection method includes: a first step of irradiating a sample with wideband illuminating light which contains far ultraviolet light from a perpendicular direction, inspecting the shape of the pattern on the basis of the spectral waveform of reflecting light detected from the sample, and detecting edge roughness of the pattern on the basis of the spectral waveform of the reflecting light detected from the sample; and a second step of irradiating the sample with a laser beam from an oblique direction, and detecting edge roughness of the pattern on the basis of scattered light detected from the sample. COPYRIGHT: (C)2010,JPO&INPIT