发明名称 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 An immersion projection optical system that prevents leakage of a liquid (immersion liquid) into the optical system and maintains satisfactory imaging capability. The projection optical system of the present invention is a projection optical system that projects a reduced image of a first plane onto a second plane through a liquid. The projection optical system includes an interface optical lens (Lb) having a side towards the first plane that contacts a gas and a side towards the second plane that contacts the liquid. The interface optical element includes a light entering surface (Lba), which has a convex shape facing towards the first plane, and a groove (Gr), which is formed to surround an effective region in a light emitting surface of the interface optical element.
申请公布号 EP1881520(A4) 申请公布日期 2010.06.02
申请号 EP20060746084 申请日期 2006.05.08
申请人 NIKON CORPORATION 发明人 OMURA, YASUHIRO
分类号 H01L21/027;G02B13/18;G02B13/24;G02B17/08;G03F7/20 主分类号 H01L21/027
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