发明名称 Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
摘要 A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
申请公布号 DE602005020720(D1) 申请公布日期 2010.06.02
申请号 DE20056020720T 申请日期 2005.08.05
申请人 ASML NETHERLANDS B.V.;ASML HOLDING, N.V. 发明人 KEMPER, NICOLAAS RUDOLF;COX, HENRIKUS HERMAN MARIE;DONDERS, SJOERD NICOLAAS LAMBERTUS;DE GRAAF, ROELOF FREDERIK;HOOGENDAM, CHRISTIAAN ALEXANDER;TEN KATE, NICOLAAS;MERTENS, JEROEN JOHANNES SOPHIA MARIA;VAN DER MEULEN, FRITS;TEUNISSEN, FRANCISCUS JOHANNES HERMAN MARIA;VAN DER TOORN, JAN-GERARD CORNELIS;VERHAGEN, MARTINUS CORNELIS MARIA;BELFROID, STEFAN PHILIP CHRISTIAAN;SMEULERS, JOHANNES PETRUS MARIA;VOGEL, HERMAN
分类号 G03F7/20 主分类号 G03F7/20
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