发明名称 |
EXPOSURE EQUIPMENT, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD |
摘要 |
An exposure apparatus EX is provided with a projection optical system PL, and the projection optical system PL includes a first optical element LS1 disposed most closely to an image plane of the projection optical system PL. The exposure apparatus EX includes a first liquid immersion mechanism 1 which forms a first liquid immersion area LR1 of a first liquid LQ1 between the first optical element LS1 and an upper surface 65 of a transparent member 64 provided on a side of the image plane of the projection optical system PL, and an observation unit 60 which observes a state of the first liquid immersion area LR1. It is possible to grasp the state of the liquid immersion area of the liquid, thereby executing optimum liquid immersion exposure. |
申请公布号 |
EP1791164(B1) |
申请公布日期 |
2010.06.02 |
申请号 |
EP20050767342 |
申请日期 |
2005.08.01 |
申请人 |
NIKON CORPORATION |
发明人 |
OWA, SOICHI;NAGASAKA, HIROYUKI;SUGAWARA, RYU |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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