发明名称 Semiconductor device, wiring substrate, and method for manufacturing wiring substrate
摘要 The reliabilities of a wiring substrate and a semiconductor apparatus are improved by reducing the internal stress caused by the difference of thermal expansion coefficients between a base substrate and a semiconductor chip. A wiring layer (5) is provided on one surface of a silicon base (3). An electrode as the uppermost layer of the wiring layer (5) is provided with an external bonding bump (7). A through-electrode (4) is formed in the base (3) for electrically connecting the wiring layer (5) and an electrode terminal. The electrode terminal on the chip mounting surface is bonded to an electrode terminal of a semiconductor chip (1) by an internal bonding bump (6). The thermal expansion coefficient of the silicon base (3) is equivalent to that of the semiconductor chip (1) and not more than that of the wiring layer (5).
申请公布号 US7728439(B2) 申请公布日期 2010.06.01
申请号 US20050536025 申请日期 2005.05.23
申请人 NEC CORPORATION 发明人 NISHIYAMA TOMOHIRO;TAGO MASAMOTO
分类号 H01L23/48;H01L23/14;H01L23/52;H01L29/40 主分类号 H01L23/48
代理机构 代理人
主权项
地址