发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device including: a semiconductor substrate having an electrode; a resin protrusion formed on a surface of the semiconductor substrate on which the electrode is formed, the resin protrusion extending along a straight line and having a sloping region of which a height decreases along the straight line as a distance from a center of the resin protrusion increases; and an interconnect electrically connected to the electrode and extending over the sloping region of the resin protrusion.
申请公布号 US7728424(B2) 申请公布日期 2010.06.01
申请号 US20060493560 申请日期 2006.07.27
申请人 SEIKO EPSON CORPORATION 发明人 ASAKAWA TATSUHIKO;KATO HIROKI
分类号 H01L23/12 主分类号 H01L23/12
代理机构 代理人
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