发明名称 Semiconductor device in which GaN-based semiconductor layer is selectively formed
摘要 A semiconductor device includes a mask layer having openings on a substrate, a GaN-based semiconductor layer selectively formed on the substrate with the mask layer that serves as a mask, a gate electrode and either a source electrode or an emitter electrode formed on the GaN-based semiconductor layer, and a drain electrode or a collector electrode connected on a surface of the first semiconductor layer that faces the GaN-based semiconductor layer or an opposite side of the first semiconductor layer.
申请公布号 US7728353(B2) 申请公布日期 2010.06.01
申请号 US20060392549 申请日期 2006.03.30
申请人 EUDYNA DEVICES INC. 发明人 YAEGASHI SEIJI;KAWASAKI TAKESHI;NAKATA KEN
分类号 H01L29/20;H01L21/336;H01L21/337;H01L21/338;H01L29/12;H01L29/739;H01L29/78;H01L29/786;H01L29/808;H01L29/812;H01L31/0328;H01L31/0336;H01L31/072;H01L31/109 主分类号 H01L29/20
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