发明名称 Thin film transistor substrate
摘要 A TFT substrate includes a gate electrode and gate pad on a transparent substrate, an insulating layer on the gate electrode and exposing a portion of the gate pad, a semiconductor film on the insulating layer and the gate electrode, an impurity doped semiconductor film on the semiconductor film, the impurity doped semiconductor film contacting a top surface of the semiconductor film over the gate electrode, source and drain electrodes and a data line on a portion of the impurity doped semiconductor film, a protection film on the source and drain electrodes and the insulating layer in a gate pad area, the protection film having a contact hole over the drain electrode exposing a top surface of the gate pad, a first pixel electrode electrically connected to the drain electrode on the protection film, and a second pixel electrode directly connected to the exposed top surface of the gate pad.
申请公布号 USRE41363(E1) 申请公布日期 2010.06.01
申请号 US20050296847 申请日期 2005.12.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE JUENG-GIL;LEE JUNG-HO;NAM HYO-RAK
分类号 G02F1/1343;H01L29/40;G02F1/1345;G02F1/136;G02F1/1362;G02F1/1368;H01L21/28;H01L21/3205;H01L21/336;H01L21/768;H01L23/482;H01L23/52;H01L27/12;H01L29/423;H01L29/49;H01L29/786 主分类号 G02F1/1343
代理机构 代理人
主权项
地址