发明名称 PHOTO RESIST DISPENSE MONITORING SYSTEM
摘要 <p>PURPOSE: A setting value is especially automatically controlled the recipe if the photoresist solution quantitative discharge monitoring system inputs the initial setting value. The quantitative discharge whether or not of the photoresist solution is more readily the monitoring. CONSTITUTION: The photoresist solution storage tank accepts the photoresist solution. The feed pump lets deliver compulsory the photoresist solution to the feeding line. The filter collects the foreign material of the photoresist solution flowing through the feeding line. The photo resist supply system(10) comprises the flow measurement sensor measuring the supply quantity of the photoresist solution. It collects the recipe information from the photo resist supply system and the information collecting part(20) transfers to the central control part(30).</p>
申请公布号 KR20100057249(A) 申请公布日期 2010.05.31
申请号 KR20080116203 申请日期 2008.11.21
申请人 JUSTIN BD&L CO., LTD. 发明人 KIM, SANG WOOK;KIM, KWANG SOO;KIM, DOO MIN
分类号 H01L21/66;H01L21/00;H01L21/027 主分类号 H01L21/66
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