发明名称 IMAGE SENSOR AND METHOD FOR MANUFACTURING THEREOF
摘要 <p>PURPOSE: A light guides of the manufacturing method thereof silver image sensor and image sensor are formed into the different width. The photonic efficiency of the image sensor is improved. CONSTITUTION: A plurality of photoelectric transform portion(110R, 110G, 110B) is formed in the semiconductor substrate(101) within the active area. In order to be income to the photoelectric transform portion a plurality of the light guide(330R, 330G, 330B) guides the light which is income from outside to the semiconductor substrate.</p>
申请公布号 KR20100057302(A) 申请公布日期 2010.05.31
申请号 KR20080116284 申请日期 2008.11.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, TAE SUB;AHN, JUNG CHAK
分类号 H01L27/146 主分类号 H01L27/146
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