发明名称 THE THIN FILM TRANSISTOR AND THE MANUFACURING METHOD THEREOF
摘要 <p>PURPOSE: A thin film transistor and a method of manufacture thereof use the ZTO channel doped with boron. The uniformity of device is enhanced a lot. CONSTITUTION: The semiconductor film is formed on the substrate(100) into the compound of the zinc oxide tin which is the boron doping. The above semiconductor thin film is the patterning and the channel(120) is formed. The channel protection layer(125) is formed on channel. The gate insulating layer(130) is formed on the channel protection layer. The gate electrode is formed on the gate insulating layer.</p>
申请公布号 KR20100057243(A) 申请公布日期 2010.05.31
申请号 KR20080116192 申请日期 2008.11.21
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 CHEONG, WOO SEOK;CHUNG, SUNG MOOK;RYU, MIN KI;HWANG, CHI SUN;CHU, HYE YONG
分类号 H01L29/786;G02F1/136 主分类号 H01L29/786
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