发明名称 FLUID DISTRIBUTING DEVICE OF APPARATUS FOR POLISHING SILICON WAFER
摘要 PURPOSE: It leaves the phase difference inside the fluid dispenser and the fluid dispenser for the silicon wafer polisher minimizes the fluid flux declination in multi-domain. The wafer polishing amount is uniformly and the plane improves the quality. CONSTITUTION: The distributor main body of cylindrical is prepared. The fluid inlet tube(110) flows in the fluid as the distributor inner part of the main body. The distribution pipe(130) is installed in the lower part of the distributor main body. The distribution pipe transfers the flowing fluid to the necessary location the respective dispersion. It nears, in the lower part of the distributor main body, the central part(122) forms the level difference than the peripheral part(121) towards the fluid inlet tube.
申请公布号 KR20100057140(A) 申请公布日期 2010.05.31
申请号 KR20080116029 申请日期 2008.11.21
申请人 SILTRON INC. 发明人 CHOI, CHUL HO;LEE, HYUNG RAK
分类号 H01L21/02 主分类号 H01L21/02
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