发明名称 METHOD OF MANUFACTURING IRON SILICIDE SPUTTERING TARGET AND IRON SILICIDE SPUTTERING TARGET
摘要 PROBLEM TO BE SOLVED: To provide iron silicide powder small in oxygen of a gas component contained in the iron silicide powder and easy to be pulverized to decrease the incorporation of impurities produced when the pulverization has failed, having large specific surface area of the iron silicide powder and increasing the density when being sintered. SOLUTION: The iron silicide powder mainly comprising FeSi<SB>2</SB>is manufactured by reducing iron oxide with hydrogen to form iron powder, heating the iron powder and Si powder in a non-oxidizing atmosphere to form synthetic powder mainly containing FeSi and adding and mixing Si powder again and heating in the non-oxidizing atmosphere. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010116320(A) 申请公布日期 2010.05.27
申请号 JP20100004551 申请日期 2010.01.13
申请人 NIPPON MINING & METALS CO LTD 发明人 ODA KUNIHIRO;SUZUKI SATORU
分类号 C01B33/06 主分类号 C01B33/06
代理机构 代理人
主权项
地址