发明名称 ALIGNMENT MASK AND METHOD FOR MEASURING POSITION OF LANDING DOT BY USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an alignment mask which allows a landing dot and a reference mark to be visible, with a high contrast and with high resolution and allows a correct position to be measured with high accuracy, and to provide a method for measuring a landing dot position that uses the alignment mask. SOLUTION: A light reflective layer 104 for reflecting light is layered on a base material layer 103, having the light reflectance lower than that of the light reflective layer 104 so that the light reflective layer 104 may come to the front side. The reference mark 102 is formed by removing a part of the light reflective layer 104 from the surface thereof to the base material layer 103 to expose the base material layer 103, and thereby the alignment mask 100 is prepared. A liquid droplet is discharged from a liquid droplet discharge head and stuck, while using the reference mark 102 on the surface of the alignment mask 100 as a target instead of a work. Then, the landing dot of the discharged liquid droplet and the reference mark 102 are image-recognized from the surface side by using a camera, so that the positional relationship between the landing dot and the reference mark 102 is defined from the image-recognized result. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010117441(A) 申请公布日期 2010.05.27
申请号 JP20080289206 申请日期 2008.11.11
申请人 KONICA MINOLTA HOLDINGS INC 发明人 TAKATO YOSHIFUMI
分类号 G02B5/20;B05C11/00;B05D3/00 主分类号 G02B5/20
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