| 摘要 |
<p>A method for producing a substrate having a patterned conductive polymer film, wherein removability is excellent and discoloration in an end portion of a conductive polymer film is suppressed when a resist film is removed from the conductive polymer film. The method for producing a substrate having a patterned conductive polymer film, which is characterized by comprising, in the following order: a step of forming a substrate on which a conductive polymer film and a patterned resist film are arranged in this order; a step of etching the conductive polymer into a pattern corresponding to the pattern of the resist film; and a step of removing the resist film on the conductive polymer film using a remover liquid. The method is also characterized in that the remover liquid contains 5-40% by weight of an organic solvent (A) selected from the group consisting of N-alkyl pyrrolidones, carboxylic acid amide compounds, dialkyl sulfoxides and ether compounds, and 60-95% by weight of an organic solvent (B) selected from the group consisting of alkyl lactones, alkylene carbonates and polyhydric alcohols.</p> |
