发明名称 METHOD AND APPARATUS OF COATING PHOTO RESIST COMPOSITION ON THE OBJECT
摘要 <p>PURPOSE: A method and a device for coating a photoresist composition are provided to coat the photoresist composition on a substrate with uniform thickness by maintaining a constant space between the substrate and the spray unit. CONSTITUTION: A spray unit(101) spreads a photoresist composition on a substrate. A transfer unit(103) transfers the substrate for coating the photoresist composition in one direction. A distance measuring unit(105) measures the distance between the substrate positioned on the transfer unit and the spraying unit. A distance controller receives the data from the distance measuring unit and controls the distance between the spray unit and the substrate when the distance between the substrate and the spray unit is out of the preset range.</p>
申请公布号 KR20100055768(A) 申请公布日期 2010.05.27
申请号 KR20080114637 申请日期 2008.11.18
申请人 SEMES CO., LTD. 发明人 HAM, SEUNG WON
分类号 H01L21/027 主分类号 H01L21/027
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