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发明名称
ZINC OXIDE BASED SPUTTERING TARGET, METHOD FOR MAMUFACTURING THE SAME AND ZINC OXIDE BASED THIN FILM MANUFACTURED BY USING THE SAME
摘要
申请公布号
KR100960222(B1)
申请公布日期
2010.05.27
申请号
KR20080063053
申请日期
2008.06.30
申请人
发明人
分类号
C04B35/453
主分类号
C04B35/453
代理机构
代理人
主权项
地址
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