| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: a photosensitive resin composition having excellent coating property and sufficiently high basic performances as a photosensitive interlayer dielectric material, such as photosensitive characteristic; a method for forming a silica-based film using the composition; and a semiconductor device, a flat panel display device and a member for an electronic device including a silica-based film formed by the method. <P>SOLUTION: The photosensitive resin composition includes (a) a siloxane resin obtained by hydrolytic condensation of a silane compound including a compound represented by general formula (1), (b) a solvent in which the component (a) dissolves, (c) an ester compound of phenols or alcohols and a naphthoquinone diazide sulfonic acid, and (d) a surfactant, wherein, in formula (1), R<SP>1</SP>denotes an organic group; A denotes a divalent organic group; X denotes a hydrolyzable group and a plurality of symbols X within the same molecule may be the same or different. <P>COPYRIGHT: (C)2010,JPO&INPIT |
