| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering apparatus promoting ionization of sputtering particles by preventing generation of arc discharge and increasing the pulse peak current as much as possible. <P>SOLUTION: In the sputtering apparatus having a power supply device for supplying DC pulse power to a plurality of sputtering evaporation sources, the power supply device includes: one DC power source; a pulse distribution and supply means for distributing and supplying the power stored in an electric energy storage section for each sputtering evaporation source; a current sensor provided on at least one of the plurality of sputtering evaporation sources to measure the current flowing in the sputtering evaporation source; a pulse peak current detection section for obtaining the detected value of the pulse peak current flowing in the sputtering evaporation source based on the output of the current sensor; and a pulse peak current control section for controlling the output of the DC power source so that the detected value of the pulse peak current detected by the pulse peak current detection section does not exceed the target value of the pulse peak current not to generate the arc discharge. <P>COPYRIGHT: (C)2010,JPO&INPIT |
