| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a solid-state imaging apparatus capable of obtaining an image of high quality by enhancing color separation characteristics and sensitivity, and to provide a method of manufacturing the same. Ž<P>SOLUTION: The solid-state imaging apparatus has a plurality of pixels arranged in two dimensions to form an imaging region, and each of the pixels includes a photoelectric conversion portion 130 provided in a semiconductor substrate 131 and converting light into an electric charge signal, a microlens 110 provided on a first surface of the semiconductor substrate 131 and condensing light incident on the first surface on the photoelectric conversion portion 130, a gate electrode 141 provided on a second surface of the semiconductor substrate 131 on the opposite side from the first surface and controlling a read of signal charges accumulated in the photoelectric conversion portion 130, and a reflecting film 150 provided on the second surface, the reflecting film 150 having a curved-surface shape for reflecting the light incident on the first surface through the microlens 110 and transmitted through the semiconductor substrate 131 to the photoelectric conversion portion 130. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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