发明名称 SEMICONDUCTOR DEVICE HAVING INCREASED ACTIVE REGION WIDTH AND METHOD FOR MANUFACTURING THE SAME
摘要 The disclosed semiconductor device includes a plurality of active patterns including first active patterns which protrude from a semiconductor substrate and have a first width and second active patterns which are connected to upper ends of the respective first active patterns and have a second width greater than the first width. The semiconductor device further includes isolation patterns respectively located between the active patterns to insulate the active patterns from one another.
申请公布号 US2010129979(A1) 申请公布日期 2010.05.27
申请号 US20100695308 申请日期 2010.01.28
申请人 HYNIX SEMICONDUCTOR INC. 发明人 CHOI SHIN GYU
分类号 H01L21/762 主分类号 H01L21/762
代理机构 代理人
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