Copolymer for chemical amplification type photoresist and photoresist composition thereof,申请号KR20080034293-传众专利搜索

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发明名称	Copolymer for chemical amplification type photoresist and photoresist composition thereof
摘要
申请公布号	KR100959841(B1)	申请公布日期	2010.05.27
申请号	KR20080034293	申请日期	2008.04.14
申请人		发明人
分类号	G03F7/004	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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