| 发明名称 |
MULTILAYER FILM REFLECTION MIRROR, MULTILAYER FILM REFLECTION MASK, AND EUV EXPOSURE DEVICE USING THOSE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multilayer film reflection mirror that can be improved in reflection factor without increasing the number of layers of a multilayer film. <P>SOLUTION: The multilayer film reflection mirror is formed by alternately providing Mo-Si pair layers of Mo layers composed principally of Mo and Si layers composed principally of Si on a base, thicknesses of Mo layers and Si layers of first to (n)th pair layers right above the base are made equal to one another and (n) value is set to ≤20. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010118437(A) |
申请公布日期 |
2010.05.27 |
| 申请号 |
JP20080289690 |
申请日期 |
2008.11.12 |
| 申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
TOYAMA NOBUTO |
| 分类号 |
H01L21/027;G03F1/22;G03F1/24;G21K1/06 |
主分类号 |
H01L21/027 |
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