| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface inspection apparatus that reduces the inspection time. Ž<P>SOLUTION: A surface inspection apparatus 1 includes: edge detectors 30-50 to detect the status in the vicinity of an edge on a wafer 10; an arithmetic processing unit 70 to perform inspection in the vicinity of the edge on the wafer 10 depending on the outputs from the edge detectors 30-50; and a wafer holding section 20 for performing relative rotation of the wafer 10 relative to the edge detectors 30-50. The edge detectors 30-50 detect the status in the vicinity of the edge on the wafer 10 while performing the relative rotation by the wafer holding section 20, and the arithmetic processing unit 70 performs inspection in the vicinity of the edge on the wafer 10 depending on the outputs from the edge detectors 30-50. Pre-alignment sensors 61-63 are provided that detect an edge on the wafer 10. Depending on the outputs from the pre-alignment sensors 61-63, the arithmetic processing unit 70 corrects an operating status of the first and second edge detectors 30, 40, and the output from the third edge detector 50 to the arithmetic processing unit 70. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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