发明名称 NOZZLE AND APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING THE NOZZLE
摘要 A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate supporting member including a spin head on which a substrate is placed, a nozzle discharging processing liquid to the substrate placed on the spin head, and a processing liquid supplying source supplying the processing liquid to the nozzle. The nozzle includes a nozzle main body that has a plurality of discrete discharging openings and an integration discharging opening. The discrete discharging openings have a slit-shaped cross section having a first length and are arrayed in series in a predetermined direction. The integration discharging opening is formed by connecting the discrete discharging openings to each other in a single slot shape having a length greater than the first length, and finally discharges the processing liquid.
申请公布号 US2010130022(A1) 申请公布日期 2010.05.27
申请号 US20090620699 申请日期 2009.11.18
申请人 SEMES CO., LTD. 发明人 PARK SUNG-WOON;PARK SANG UK;GO JAE SEUNG
分类号 H01L21/46;B05C5/00 主分类号 H01L21/46
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