发明名称 |
FRONT END OF LINE PLASMA MEDIATED ASHING PROCESSES AND APPARATUS |
摘要 |
Front end of line (FEOL) plasma mediated ashing processes for removing organic material from a substrate generally includes exposing the substrate to the plasma to selectively remove photoresist, implanted photoresist, polymers and/or residues from the substrate, wherein the plasma contains a ratio of active nitrogen and active oxygen that is larger than a ratio of active nitrogen and active oxygen obtainable from plasmas of gas mixtures comprising oxygen gas and nitrogen gas. The plasma exhibits high throughput while minimizing and/or preventing substrate oxidation and dopant bleaching. Plasma apparatuses are also described.
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申请公布号 |
US2010130017(A1) |
申请公布日期 |
2010.05.27 |
申请号 |
US20080275394 |
申请日期 |
2008.11.21 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
LUO SHIJIAN;ESCORCIA ORLANDO;WALDFRIED CARLO;BERRY IVAN |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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