| 摘要 |
PURPOSE: A photo mask blank for an exposure apparatus, a manufacturing method thereof, and a manufacturing method of photo mask using thereof are provided to improve the density of a thin film, and to improve the light resistance of a phase shift film and a light-shielding layer. CONSTITUTION: A photo mask blank comprises a light-transmissive substrate and a thin film for forming a transfer pattern on the light-transmissive substrate. The decrease rate of the film thickness of the thin film is less than 2% when pressurizing the thin film with 4,000 pressure. The thin film is either a phase shift film or a light-shielding layer formed with a material including a transition metal silicide compound. The transition metal silicide compound is molybdenum silicide. |
