| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology suitable for measuring a surface position at the same measuring part in a plurality of shot regions. <P>SOLUTION: The exposure device includes: a projection optical system; a stage which holds a substrate to move; a measuring instrument which measures a position of the surface of the substrate regarding the direction of an optical axis of the projection optical system; and a control part which controls the stage and the measuring instrument, wherein the control part generates a first measuring part list which is a list of measuring parts symmetrically arranged at predetermined pitches at the center of the shot region so as to be along the direction of scanning, and in control of the measuring instrument, first control for making the measuring instrument measure the position of the surface at a measuring part included in the first measuring part list, and second control for making the measuring instrument measure the position of the surface at a measuring part included in a second measuring part list obtained by removing the measuring part to be measured first from the first measuring part list in a measuring part which is finally measured in the shot region and/or the next shot region are included. <P>COPYRIGHT: (C)2010,JPO&INPIT |
