| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of cleaning a substrate processing apparatus including ion beam generators arranged opposite to each other, and a substrate processing apparatus having this function. SOLUTION: The method for cleaning the substrate processing apparatus in which a first and a second ion beam generators 1a, 1b are arranged opposite to each other across a plane S on which a substrate is to be placed, and which processes two surfaces of the substrate, includes steps of retreating the substrate from a position between the first ion beam generator 1a and the second ion beam generator 1b, and cleaning the second ion beam generator by emitting an ion beam from the first ion beam generator to the second ion beam generator. COPYRIGHT: (C)2010,JPO&INPIT |
