发明名称 Semiconductor devices including a dielectric layer
摘要 A semiconductor device includes a substrate and a doped hafnium oxide layer disposed on the substrate, the doped hafnium oxide layer including a hafnium oxide layer doped with doping atoms and having tetragonal unit lattices, an ion size of the doping atom being greater than an ion size of a hafnium atom.
申请公布号 US2010127319(A1) 申请公布日期 2010.05.27
申请号 US20090591533 申请日期 2009.11.23
申请人 LIM JAESOON;CHO KYUHO;CHOI JAEHYOUNG;KIM YOUNSOO 发明人 LIM JAESOON;CHO KYUHO;CHOI JAEHYOUNG;KIM YOUNSOO
分类号 H01L29/792 主分类号 H01L29/792
代理机构 代理人
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