| 摘要 |
A developing method includes the steps of setting a resist substrate on a turntable, the resist substrate including a substrate, an inorganic resist layer formed on the substrate, and a latent image formed by exposure to light; discharging developer to a developer application position on an upper surface of the inorganic resist layer while rotating the turntable, the developer application position being away from the center of the resist substrate; irradiating a monitor position on the upper surface of the inorganic resist layer with laser light, the monitor position being different from the developer application position; and continuously discharging the developer, while detecting the amounts of zeroth order light and first order light reflected by the upper surface of the inorganic resist layer and monitoring the light amount ratio of the first order light to the zeroth order light, until the light amount ratio becomes a predetermined value.
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