发明名称 BiMO PARTICLE MANUFACTURING METHOD AND PHOTOCONDUCTIVE LAYER
摘要 A method for manufacturing a BiMO particle (M is either one of Si, Ge, Ti, and Sn), in which at least one type of compound selected from the group consisting of a silicon compound, a germanium compound, a titanium compound, and a tin compound is reacted with a bismuth compound by agitating and mixing the compounds in an alkali water solution in the presence of an amino compound.
申请公布号 US2010129280(A1) 申请公布日期 2010.05.27
申请号 US20090626429 申请日期 2009.11.25
申请人 FUJIFILM CORPORATION 发明人 HIRAI HIROYUKI;NIINO YOSHIKO
分类号 C01B33/20;C01G23/00;C01G29/00 主分类号 C01B33/20
代理机构 代理人
主权项
地址