发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY
摘要 PURPOSE: A photosensitive resin composition, a coating film and a pattern including thereof, and a display device including thereof are provided to prevent a frosty smudge, a column striation on the coating film. CONSTITUTION: A photosensitive resin composition contains a resin, a polymerization compound, a polymerization initiator and a solvent. The solvent contains an alkylene group with the carbon number of 1~3, a dialkylene glycol dialkyl ether including an alkyl group with the carbon number of 1~4, and alcohol with the carbon number of 1~6. 30~09mass% of dialkylene glycol dialkyl ether and 10~50mass% of alcohol is mixed for the total amount of the solvent. The dialkylene glycol dialkyl ether is diethylene glycol ethyl methyl ether.
申请公布号 KR20100056384(A) 申请公布日期 2010.05.27
申请号 KR20090109593 申请日期 2009.11.13
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 SHIRAKAWA MASAKAZU
分类号 G03F7/027;G03F7/028 主分类号 G03F7/027
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