| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method for producing a mold of a good patterning shape by suppressing dulling of a taper angle of a pattern shape. Ž<P>SOLUTION: The pattern forming method of forming patterns of different shapes for respective layers, by forming two photoresist layers on a substrate, has (a) the process of sequentially forming a first photoresist film and a second photoresist film on the substrate, (b) the process of exposing and developing the pattern formed on the first photoresist film to the first and second photoresist films in a batch, and (c) the process of exposing and developing the pattern formed on the second photoresist film to the second photoresist film. Moreover, an absorption wavelength region of the first photoresist film partly overlaps an absorption wavelength region of the second photoresist film, and an exposure wavelength of the process (b) includes a wavelength component of the overlapping absorption wavelength region in the pattern forming method. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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