SUBSTRATE TREATING APPARATUS AND METHOD FOR TREATING SUBSTRATE USING THE SAME

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method using the same are provided to selectively process the substrate by partially controlling the temperature of the substrate. CONSTITUTION: A substrate is loaded on a plate(112). A processing supply unit supplies chemical to the substrate. The plate includes a temperature controller(132) which controls the temperature of the substrate. The temperature controller includes a plurality of regions which includes a heating unit or cooling unit.