| 摘要 |
PURPOSE: A shower head for a plasma processing device is provided to constantly maintain partial pressure of a source gas by forming a division path inside a partitioned cell to flow the source gas in an opposite direction to each other. CONSTITUTION: A plurality of cells partition a shower head(102). A plurality of division paths divides the inside of the cell and flow the source gas in the opposite direction. An inlet(125,125a,125b) is formed on the division path and injects the source gas into the division path. The inlet is formed to make the flow directions of the source gas between cells opposite to each other.
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