发明名称 PROCEDURE AND FACILITY FOR GROWING SILICON CRYSTAL ON BASE
摘要 FIELD: metallurgy. ^ SUBSTANCE: invention refers to growing poly-crystal layers of silicon out of melt, particularly to procedures of application of thin films of silicon in base for fabricating solar cells. The facility for growing poly-crystal layers 5 of silicon consists of crucible 1 for melt 2 of silicon, of base 4 out of graphite foil corresponding to an electrode of a solar photo-cell, and of a capillary feeder equipped with at least one rotating roller 3 contacting melt 2 of silicon in crucible 1. The roller can be made with textured surface. During crystal growing the roller is transferred relative to the base or the base is transferred relative to the roller. The roller is arranged either above or under the base. Several alloying substances are simultaneously applied on the base with the roller. The roller and the base are arranged relative to each another in such a way as to ensure application of silicon in vertical or horizontal plane. ^ EFFECT: facilitating decreased expenditure of silicon due to less thickness of silicon layers (30-50 mcm) at width equal to width of standard solar plate of 156 mm, increased rate of application up to 5 cm per minute and more, decreased number of operations at fabrication due to eliminating operation of electrode application and finally reduced prime cost of solar cell while maintaining its functional characteristics. ^ 6 cl, 4 dwg
申请公布号 RU2390589(C1) 申请公布日期 2010.05.27
申请号 RU20080136743 申请日期 2008.09.15
申请人 MANCHULJANTSEV OLEG ALEKSANDROVICH 发明人 MANCHULJANTSEV OLEG ALEKSANDROVICH
分类号 C30B15/34;C30B28/10;C30B29/06 主分类号 C30B15/34
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