| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve a problem that when exposure is carried out in a stage-inclined state during adjustment of an integral exposure amount on an irradiated surface wherein the scanning-directional length of an irradiation area in a slit shape is changed by positions in a direction (slit direction) perpendicular to the scanning direction in a scanning aligner having a conventional variable slit device for adjusting the integral exposure amount on the irradiated surface, effect of stage inclination is different with the slit-directional positions, and then differences in exposure beam width are generated by the slit-directioinal positions. <P>SOLUTION: The scanning aligner includes a lighting optical system which lights up an original R using light from a light source, and a projection optical system PO which projects a pattern, formed on the original R, on a substrate W, and has a variable slit device 12 which generates illumination light in a rectangular shape to have a dimmed or light-shielded area at a scanning-directional center position of the illumination light in the rectangular shape, so that the scanning-directional width of the dimmed or light-shielded area can be adjusted for each of the slit-directional positions. <P>COPYRIGHT: (C)2010,JPO&INPIT |
