SEMICONDUCTOR MANUFACTURING EQUIPMENT, VALVE DEVICE, CVD TREATMENT METHOD USING THE SEMICONDUCTOR MANUFACTURING EQUIPMENT, AND METHOD OF MANUFACTURING SEMICONDUCTOR

摘要

<P>PROBLEM TO BE SOLVED: To provide semiconductor manufacturing equipment where formation of a solid film on a flow passage wall face is prevented, and a load on cleaning is remarkably reduced so as to improve an operation rate. Ž<P>SOLUTION: In the semiconductor manufacturing equipment where a valve device having a fixing part such as a valve box 2 and a movable part such as a valve body 9 is provided between a reaction chamber and an exhaust pump, a heater for the fixing part is provided to the fixing part of the valve device. In this way, the formation of the solid film on a flow passage wall face is prevented, and the operation rate of the semiconductor manufacturing equipment is improved. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž