| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor phase deposition system where a purge gas can be uniformly fed to a heater. Ž<P>SOLUTION: The vapor phase deposition system incldues: a heater 7 for heating the substrate 5 to be subjected to vapor deposition; a susceptor 6 for holding the substrate 5; a plurality of planar confronted reflectors 8a, 8b, 8c mutually horizontally installed on the side opposite to the substrate to the heater 7 for suppressing heat dissipation at the side confronted with the heater; and a side face reflector 9 suppressing heat dissipation in the side face side of the heater 7. The system includes, from the side opposite to the substrate 5 to the heater 7, a purge gas feed tube 13 feeding a purge gas to the confronted reflectors and an exhaust port 3 exhausting the purge gas, a plurality of vent holes are formed at the respective confronted reflectors 8a, 8b, 8c, and, among the confronted reflectors, the plurality of vent holes formed at the adjoining confronted reflectors are formed at the positions not confronted each other. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
|
