发明名称 |
Sn OR Sn ALLOY PLATING FILM AND METHOD FOR PRODUCING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a Pb-free Sn or Sn alloy plating film in which a risk that whiskers are generated from the surface of the plating film around a conductor or solder is reduced or whiskers are hardly generated even in an environment where high external stress such as fitting with a connector is applied. Ž<P>SOLUTION: The Sn or Sn alloy plating film includes: an intermetallic compound layer 2 formed on the surface of a base material 1, composed of an intermetallic compound between the base material 1 and Sn and having electroconductivity; and a network structure 11 formed on the surface of the intermetallic compound layer 2 and composed of Sn or an Sn alloy. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010116603(A) |
申请公布日期 |
2010.05.27 |
申请号 |
JP20080290951 |
申请日期 |
2008.11.13 |
申请人 |
HITACHI CABLE LTD |
发明人 |
FUJITO KEISUKE;TSUJI TAKAYUKI |
分类号 |
C25D5/24;C25D7/00;H01R13/03;H05K1/09;H05K1/11;H05K3/24;H05K3/40 |
主分类号 |
C25D5/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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