| 摘要 |
A mask blank-use translucent substrate that corrects a recessed defect in the translucent substrate surface to prevent the occurrence of a transfer pattern defect and a mask patter defect, production methods for a mask blank and an exposing mask, and a method of correcting a defect in an exposing mask. An exposing mask having mask patterns as transfer patterns formed on a translucent substrate (1), wherein the surrounding portion of a recessed defect (3), in a substrate surface (1a) where a mask pattern is not formed, that causes a reduction in transmitted light quantity leading to a transfer pattern defect is removed by a needle-like member (4), and a correction is made so as to reduce the step difference between the substrate surface and the recessed defect depth. Such a recessed defect is corrected before the stage of forming a mask pattern-forming thin film on the translucent substrate. The recessed defect-corrected translucent substrate is used to produce a mask blank and an exposing mask. |
