| 摘要 |
In an imprint method, a step of forming a pattern by imprinting a pattern of a mold onto a resin material on a substrate is repeated multiple times. The imprint method includes: a step of preparing the mold including a light blocking member at a position in which the pattern is not formed; a step of forming a pattern for a first time through steps including a step of bringing the mold into contact with a photocurable resin material provided on the substrate, a step of forming a first processed area by curing the photocurable resin material through light irradiation, and a step of removing a part of the photocurable resin material extruded from the first processed area into an outside area at a periphery of the first processed area: and a step of forming a pattern for a second time through steps including a step of bringing the mold into contact with a photocurable resin material provided on the substrate in an area which includes the outside area and is adjacent to the first processed area, a step of forming a second processed area by curing the photocurable resin material in the area, and a step of removing a part of the photocurable resin material extruded from the second processed area at a periphery of the second processed area. |
