发明名称 |
APPARATUS FOR PROCESSING A SUBSTRATE |
摘要 |
<p>PURPOSE: A substrate processing apparatus is provided to improve efficiency of a work by reducing a non-operation time of a system and time for maintenance. CONSTITUTION: A chamber has an internal space. A substrate support unit(200) is installed in the chamber and includes a spin head on which a substrate is loaded. A processing container is installed to surround the spine head and collects processing fluid dispersed on the substrate and includes an upper body(110) and a lower body(120). The upper body surrounds the spin head and is combined with the chamber with a hinge shaft to be outputted to one side of the chamber. The lower body is arranged under the upper body and is connected to an exhaust line and a discharge line.</p> |
申请公布号 |
KR20100055681(A) |
申请公布日期 |
2010.05.27 |
申请号 |
KR20080114523 |
申请日期 |
2008.11.18 |
申请人 |
SEMES CO., LTD. |
发明人 |
PARK, SUNG WOON;CHOI, JIN HO |
分类号 |
H01L21/02;H01L21/027 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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