发明名称 APPARATUS FOR PROCESSING A SUBSTRATE
摘要 <p>PURPOSE: A substrate processing apparatus is provided to improve efficiency of a work by reducing a non-operation time of a system and time for maintenance. CONSTITUTION: A chamber has an internal space. A substrate support unit(200) is installed in the chamber and includes a spin head on which a substrate is loaded. A processing container is installed to surround the spine head and collects processing fluid dispersed on the substrate and includes an upper body(110) and a lower body(120). The upper body surrounds the spin head and is combined with the chamber with a hinge shaft to be outputted to one side of the chamber. The lower body is arranged under the upper body and is connected to an exhaust line and a discharge line.</p>
申请公布号 KR20100055681(A) 申请公布日期 2010.05.27
申请号 KR20080114523 申请日期 2008.11.18
申请人 SEMES CO., LTD. 发明人 PARK, SUNG WOON;CHOI, JIN HO
分类号 H01L21/02;H01L21/027 主分类号 H01L21/02
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