发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT EMPLOYING THE SAME, METHOD OF FORMING RESIST PATTERN, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD
摘要 The photosensitive resin composition of the present invention is a photosensitive resin composition comprising: (A) a binder polymer; (B) a photopolymerizable compound with at least one polymerizable ethylenic unsaturated group in the molecule; and (C) a photopolymerization initiator, wherein component (A) contains a polymer that contains a compound represented by the following general formula (I) as a polymerization component: CH2═C(L1)-COOL2  (I) (wherein L1 represents a hydrogen atom or methyl group and L2 represents a C2-20 alkyl group group) and component (B) contains a compound represented by the following general formula (II): (wherein R1 represents a hydrogen atom or methyl group, R2 represents a C3-20 alkyl group that has at least 2 tertiary or higher carbon atoms, X represents a C2-6 alkylene group, and n is an integer from 1 to 20).
申请公布号 US2010129752(A1) 申请公布日期 2010.05.27
申请号 US20060916212 申请日期 2006.05.15
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 AJIOKA YOSHIKI;ICHIKAWA TATSUYA;MATSUDA MITSUO;INATSUGI TAKAHIRO
分类号 G03F7/027;C08F2/44;C08F2/50;G03F7/004;G03F7/033;G03F7/20;H05K3/00;H05K3/06;H05K3/18 主分类号 G03F7/027
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