发明名称 DEVICE USING ELECTRON BEAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a device using an electron beam capable of preventing the device from being enlarged in total and stabilizing a substrate current without additional cost, by using an existing antistatic member for also controlling the substrate current value. Ž<P>SOLUTION: The device using the electron beam, which uses an electron beam 41 focused and radiated to a sample 21 through an optical system arranged in a body tube, includes a plate-shaped member 110 provided with an electric conduction part and an opening part through which the electron beam passes, between the optical system and the sample 21. The plate-shaped member 110 has a volume covering at least a portion of the optical system when viewed from an irradiation point of the electron beam on the surface of the sample, and is configured such that the plate-shaped member 110 performs an antistatic function. By supplying a voltage Vc to the electric conduction part of the plate-shaped member 110, and by measuring the substrate current value IAC flowing into the sample 21 when the sample 21 is irradiated with the electron beam 41, the voltage Vc supplied to the plate-shaped member 110 is controlled so that the substrate current value IAC becomes a target current value. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010118192(A) 申请公布日期 2010.05.27
申请号 JP20080289290 申请日期 2008.11.11
申请人 TOPCON CORP 发明人 TOJO TORU;AKIYAMA HISASHI;SATO YOSHISHIGE;ORUI KOTA;TAGAWA KENJI;MORITA HIROSHI;YASUMA MASUO;KANNO TADAHIRA
分类号 H01J37/20;H01L21/66 主分类号 H01J37/20
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