| 摘要 |
The invention relates to a method for forming a pattern on a substrate surface of a target (13) by means of a beam (1b) of electrically charged particles in a number of exposure steps, where the beam is split into a patterned beam (pb) and there is a relative motion between the substrate (13) and the pattern definition means (3). This results in an effective overall motion of the patterned particle beam over the substrate surface and exposition of image elements on the substrate surface in each exposure step, wherein the image elements on the target are exposed to the beamlets multiply, namely several times during a number of exposure steps according to a specific sequence. The sequence of exposure steps of the image elements is arranged in a non-linear manner according to a specific rule from one exposure step to the subsequent exposure step in order to reduce the current variations in the optical column of the multibeam exposure apparatus (1) during the exposure of the pattern. |
