发明名称 |
Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography |
摘要 |
<p>New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises one or more materials that have hetero-substituted carbocyclic aryl groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.</p> |
申请公布号 |
EP2189847(A2) |
申请公布日期 |
2010.05.26 |
申请号 |
EP20090155458 |
申请日期 |
2009.03.18 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
WANG, DEYAN;BARCLAY, GEORGE G.;XU, CHENG-BAI |
分类号 |
G03F7/004;G03F7/038;G03F7/039;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|