发明名称 FLASH MEMORY CELL, READ METHOD AND FABRICATION METHOD THE SAME
摘要 <p>PURPOSE: A flash memory cell, a reading method thereof, and a manufacturing method thereof are provided to improve a reading speed by performing a reading operation when a gate is not turned on. CONSTITUTION: An active area of the substrate is defined by a device isolation layer. A tunneling insulation layer(12) is formed on the substrate. A P type floating gate, a dielectric layer, and a control gate(CG) are stacked on the tunneling insulation layer of the upper side of the active region. An N type drain(18) and an N type source are formed on the upper side of the tunneling insulation layer of the upper side of the device isolation layer and are separated based on the P type floating gate.</p>
申请公布号 KR20100055050(A) 申请公布日期 2010.05.26
申请号 KR20080113961 申请日期 2008.11.17
申请人 HYNIX SEMICONDUCTOR INC. 发明人 SON, MYEONG CHEOL
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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