| 摘要 |
A thin film of a uniform film thickness is formed even without increasing the film deposition rate. The temperature of an evaporation device 24 disposed in an evaporation chamber 20a is raised in advance, and an organic material 48 is dropped from a supply unit 40 onto an evaporation surface 28 of the evaporation device 24; and when the organic material 48 is evaporated, a heated carrier gas is introduced into the evaporation chamber 20a, and is mixed in the evaporation chamber 20a and is introduced into a discharger 70. While a molecular flow is formed in the discharger 70 in a case that only the organic material vapor is introduced into the discharger 70, the pressure within the discharger 70 is raised due to the carrier gas, so that a viscous flow is formed and the mixed gas is filled in the discharger 70 and is uniformly discharged. The organic material may be supplied by a small amount and the film deposition rate may not become too high.
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